Date of dispatch of this notice: 11/01/2021
External Reference: 2021-243173
TED Reference: 2021/S 010-017357
Contract award notice
Information
Published
Contract award notice
Contract award notice
Results of the procurement procedure
Directive 2014/24/EU
Section I: Contracting authority
I.1)
Name and addresses
Education Procurement Service (EPS)
IE 6609370 G
University of Limerick
Castletroy
Co.Limerick
IE
Contact person:
Eimear Brennan
Telephone:
+353 61234901
E-mail:
eimear.brennan@ul.ie
Internet address(es):
Main address:
http://www.educationprocurementservice.ie
Address of the buyer profile:
https://irl.eu-supply.com/ctm/Company/CompanyInformation/Index/87073
I.2)
Joint procurement
The contract is awarded by a central purchasing body
I.4)
Type of the contracting authority
Body governed by public law
I.5)
Main activity
Education
Section II: Object
II.1)
Scope of the procurement
II.1.1)
Title
UCC - RFT a Plasma Chemical Vapour Deposition System for Compound Semiconductors for the Tyndall National Institute
Reference number:
LEE701C
II.1.2)
Main CPV code
38000000
-
Laboratory, optical and precision equipments (excl. glasses)
II.1.3)
Type of contract
Supplies
II.1.4)
Short description
Tenders are sought for the supply, delivery and installation of a Plasma Chemical Vapour Deposition System for Compound Semiconductors for the Tyndall National Institute, UCC.
II.1.6)
Information about lots
This contract is divided into lots:
no
II.1.7)
Total value of the procurement
Lowest offer:
570500.00
EUR
/
Highest offer:
716000.00
EUR
taken into consideration
(excluding VAT)
II.2)
Description
II.2.2)
Additional CPV code(s)
31712330
-
Semiconductors
38410000
-
Metering instruments
38420000
-
Instruments for measuring flow, level and pressure of liquids and gases
38430000
-
Detection and analysis apparatus
38432000
-
Analysis apparatus
38653300
-
Apparatus and equipment for developing film
38654000
-
Microfilm and microfiche equipment
38654100
-
Microfilm equipment
II.2.4)
Description of the procurement
Tenders are sought for the supply, delivery and installation of a Plasma Chemical Vapour Deposition System for Compound Semiconductors for the Tyndall National Institute, UCC.
The Process & Product Development laboratories at Tyndall National Institute, UCC, fabricate a wide variety of Semiconductor devices, ranging from traditional Silicon microelectronics and Silicon MEMS to III-V photonic devices. We wish to extend our capability in the area of plasma deposition by purchasing a fully functional load locked PECVD (Plasma Enhanced Chemical Vapour Deposition) or ICPCVD (Inductively Coupled Plasma Chemical Vapour Deposition) system including pumps which will allow us to move our processing to a higher TRL level in terms of substrate size, deposition processes and control. The system offered must be suitable for use in a class 1000 cleanroom. As much of the work is in the area of Semiconductor R&D we have a requirement for a system that can handle substrates of varying sizes from 10 x 10 mm and various irregular shaped pieces through to 200mm wafers, including 50mm, 100mm and 150mm wafers. Due to the novel nature of the R&D and customer base we also require that the system be able to deposit a variety of film materials from dielectrics SiO2 (silicon dioxide), Si3N4 (silicon nitride) and SiOxNy (silicon oxynitride) to amorphous Silicon and SiC (silicon carbide). We have defined the technical specification in terms of these specific film materials and also for the use of TEOS (Tetraethylorthosilicate) liquid precursor for conformal SiO2 deposition and the specific requirement for low temperature deposition of SiO2 and Si3N4 as well as these materials at the more standard deposition temperature of 300C. The tenderer should also supply as part of the tender response details of the recipes to be used for cleaning when changing between deposition materials. The tender response must clearly show the costs for all items and any additional options must be clearly identified as such and costed separately. As part of
The Process & Product Development laboratories at Tyndall National Institute, UCC, fabricate a wide variety of Semiconductor devices, ranging from traditional Silicon microelectronics and Silicon MEMS to III-V photonic devices. We wish to extend our capability in the area of plasma deposition by purchasing a fully functional load locked PECVD (Plasma Enhanced Chemical Vapour Deposition) or ICPCVD (Inductively Coupled Plasma Chemical Vapour Deposition) system including pumps which will allow us to move our processing to a higher TRL level in terms of substrate size, deposition processes and control. The system offered must be suitable for use in a class 1000 cleanroom. As much of the work is in the area of Semiconductor R&D we have a requirement for a system that can handle substrates of varying sizes from 10 x 10 mm and various irregular shaped pieces through to 200mm wafers, including 50mm, 100mm and 150mm wafers. Due to the novel nature of the R&D and customer base we also require that the system be able to deposit a variety of film materials from dielectrics SiO2 (silicon dioxide), Si3N4 (silicon nitride) and SiOxNy (silicon oxynitride) to amorphous Silicon and SiC (silicon carbide). We have defined the technical specification in terms of these specific film materials and also for the use of TEOS (Tetraethylorthosilicate) liquid precursor for conformal SiO2 deposition and the specific requirement for low temperature deposition of SiO2 and Si3N4 as well as these materials at the more standard deposition temperature of 300C. The tenderer should also supply as part of the tender response details of the recipes to be used for cleaning when changing between deposition materials. The tender response must clearly show the costs for all items and any additional options must be clearly identified as such and costed separately. As part of
II.2.5)
Award criteria
Criteria below
Quality criterion
-
Name:
Technical
/
Weighting:
35%
Quality criterion
-
Name:
strategic Agreements
/
Weighting:
5%
Quality criterion
-
Name:
technical support & Maintenance
/
Weighting:
10%
Quality criterion
-
Name:
sample Assessment
/
Weighting:
10%
Price
-
Weighting:
40%
II.2.11)
Information about options
Options:
no
II.2.13)
Information about European Union funds
The procurement is related to a project and/or programme financed by European Union funds:
no
II.2.14)
Additional information
All information relating to tenders is published on www.etenders.gov.ie only
Section IV: Procedure
IV.1)
Description
IV.1.1)
Type of procedure
Open procedure
IV.1.8)
Information about the Government Procurement Agreement (GPA)
The procurement is covered by the Government Procurement Agreement
: no
IV.2)
Administrative information
IV.2.1)
Previous publication concerning this procedure
Notice number in the OJ S: 2019/S 179-435511
Section V: Award of contract
Contract No: 1
Title: UCC - RFT a Plasma Chemical Vapour Deposition System for Compound Semiconductors for the Tyndall National Institute
V.2)
Award of contract
V.2.1)
Date of conclusion of the contract
01/12/2020
V.2.2)
Information about tenders
Number of tenders received:
3
Number of tenders received by electronic means:
3
The contract has been awarded to a group of economic operators
:
noV.2.3)
Name and address of the contractor
SENTECH Instruments GmbH
DE 137 205 446
Schwarzschildstrasse 2
Berlin
D-12489
DE
Telephone:
+49 3063925525
E-mail:
gerd.jungmann@sentech.de
Fax:
+49 3063925522
Internet address:
http://www.sentech.de
The contractor is an SME : yes
V.2.4)
Information on value of the contract/lot (excluding VAT)
Lowest offer:
570500.00
EUR
/
Highest offer:
716000.00
EUR
taken into consideration
Section VI: Complementary information
VI.4)
Procedures for review
VI.4.1)
Review body
Office of the High Court
Four Courts Ground Floor, Inns Quay
Dublin
7
IE
Telephone:
+353 18886000
E-mail:
HighCourtCentralOffice@courts.ie