II.1)
Scope of the procurement
Sputter Desposition Tool for Trinity College Dublin
Reference number:
LEE091C
38000000
-
Laboratory, optical and precision equipments (excl. glasses)
Supplies
II.1.4)
Short description
CRANN, TCD is seeking to procure a state-of-the-art sputter deposition tool - ‘Trifolium Dubium’ for the development of materials and thin film devices. Magnetic tunnel junctions and Heusler alloys are expected to be a major component of the research conducted using this system, as well as blanket films and stacks of novel multiferroics, magnetic and/or transparent oxides. The system will be the core of a national access facility and will be available for use by a large number of research groups in both academia and industry, and as such performance and flexibility are paramount.
The requirement will be divided into three (3) Lots. It would be envisaged that the three (3) lots will be broken down as follows:
Lot 1: Sputter Chamber #1
Lot 2: XPS Chamber
Lot 3: Water Transfer System Arrangement & Vacuum
II.1.5)
Estimated total value
Value excluding VAT: 3240000.00
EUR
II.1.6)
Information about lots
This contract is divided into lots:
yes
Tenders may be submitted for
all lots
Maximum number of lots that may be awarded to one tenderer:
3
Sputter Chamber 1 - Desposition System
Lot No:
1
II.2.2)
Additional CPV code(s)
38200000
-
Geological and geophysical instruments
38300000
-
Measuring instruments
38400000
-
Instruments for checking physical characteristics
38430000
-
Detection and analysis apparatus
38434000
-
Analysers
38500000
-
Checking and testing apparatus
38540000
-
Machines and apparatus for testing and measuring
38800000
-
Industrial process control equipment and remote-control equipment
38900000
-
Miscellaneous evaluation or testing instruments
38970000
-
Research, testing and scientific technical simulator
II.2.3)
Place of performance
NUTS code:
IE021 -
Dublin
Main site or place of performance:
Dublin, Ireland
II.2.4)
Description of the procurement
The base tool would be split into two chambers connected via a vacuum transfer system. The tool would be a fully integrated system, with all chambers interconnected under vacuum with wafer transfer between chambers for subsequent processing steps. The tool should be capable of co-deposition of various materials with low roughness and good uniformity across 4” (100 mm) diameter substrates, including at high temperatures. One chamber would be used primarily for deposition of metals, while the other would be designed for deposition of oxides and nitrides, including reactive processes involving the introduction of oxygen and/or nitrogen into the chamber.
Additional deposition chambers such as for pulsed laser deposition (PLD) and molecular beam epitaxy (MBE) are considered, as well. These are to be fully integrated into the vacuum transfer system above. As such, a suitable Nd:YAG laser is potentially required for PLD. Finally, in an attempt to improve the in-situ characterisation capabilities, a dedicated, wafer compatible X-ray photoelectron spectroscopy (XPS) analytics chamber is also considered.
Price is not the only award criterion and all criteria are stated only in the procurement documents
II.2.7)
Duration of the contract, framework agreement or dynamic purchasing system
Duration in months:
36
This contract is subject to renewal:
no
II.2.9)
Information about the limits on the number of candidates to be invited
Envisaged minimum number:
2
/
Maximum number:
5
Objective criteria for choosing the limited number of candidates:
Previous Experience
Profile of staff members along with CV’s
Quality Assurance
II.2.10)
Information about variants
Variants will be accepted:
no
II.2.11)
Information about options
Options:
no
II.2.13)
Information about European Union funds
The procurement is related to a project and/or programme financed by European Union funds:
yes
Identification of the project:
SFI-Funding Contribution
II.2.14)
Additional information
Sputter Disposition Tool for TCD required. See PQQ for details.
Photelectron Spectroscopy Analysis Chamber
Lot No:
2
II.2.2)
Additional CPV code(s)
38200000
-
Geological and geophysical instruments
38300000
-
Measuring instruments
38400000
-
Instruments for checking physical characteristics
38430000
-
Detection and analysis apparatus
38434000
-
Analysers
38500000
-
Checking and testing apparatus
38540000
-
Machines and apparatus for testing and measuring
38800000
-
Industrial process control equipment and remote-control equipment
38900000
-
Miscellaneous evaluation or testing instruments
38970000
-
Research, testing and scientific technical simulator
II.2.3)
Place of performance
NUTS code:
IE021 -
Dublin
Main site or place of performance:
Dublin, Ireland
II.2.4)
Description of the procurement
The base tool would be split into two chambers connected via a vacuum transfer system. The tool would be a fully integrated system, with all chambers interconnected under vacuum with wafer transfer between chambers for subsequent processing steps. The tool should be capable of co-deposition of various materials with low roughness and good uniformity across 4” (100 mm) diameter substrates, including at high temperatures. One chamber would be used primarily for deposition of metals, while the other would be designed for deposition of oxides and nitrides, including reactive processes involving the introduction of oxygen and/or nitrogen into the chamber.
Additional deposition chambers such as for pulsed laser deposition (PLD) and molecular beam epitaxy (MBE) are considered, as well. These are to be fully integrated into the vacuum transfer system above. As such, a suitable Nd:YAG laser is potentially required for PLD. Finally, in an attempt to improve the in-situ characterisation capabilities, a dedicated, wafer compatible X-ray photoelectron spectroscopy (XPS) analytics chamber is also considered.
Price is not the only award criterion and all criteria are stated only in the procurement documents
II.2.7)
Duration of the contract, framework agreement or dynamic purchasing system
Duration in months:
36
This contract is subject to renewal:
no
II.2.9)
Information about the limits on the number of candidates to be invited
Envisaged minimum number:
2
/
Maximum number:
5
Objective criteria for choosing the limited number of candidates:
Previous Experience
Profile of staff members along with CV’s
Quality Assurance
II.2.10)
Information about variants
Variants will be accepted:
no
II.2.11)
Information about options
Options:
no
II.2.13)
Information about European Union funds
The procurement is related to a project and/or programme financed by European Union funds:
yes
Identification of the project:
SFI-Funding Contribution
II.2.14)
Additional information
Sputter Disposition Tool for TCD required. See PQQ for details.
PLD Laser & Optics
Lot No:
3
II.2.2)
Additional CPV code(s)
38200000
-
Geological and geophysical instruments
38300000
-
Measuring instruments
38400000
-
Instruments for checking physical characteristics
38430000
-
Detection and analysis apparatus
38434000
-
Analysers
38500000
-
Checking and testing apparatus
38540000
-
Machines and apparatus for testing and measuring
38800000
-
Industrial process control equipment and remote-control equipment
38900000
-
Miscellaneous evaluation or testing instruments
38970000
-
Research, testing and scientific technical simulator
II.2.3)
Place of performance
NUTS code:
IE021 -
Dublin
Main site or place of performance:
Dublin, Ireland
II.2.4)
Description of the procurement
The base tool would be split into two chambers connected via a vacuum transfer system. The tool would be a fully integrated system, with all chambers interconnected under vacuum with wafer transfer between chambers for subsequent processing steps. The tool should be capable of co-deposition of various materials with low roughness and good uniformity across 4” (100 mm) diameter substrates, including at high temperatures. One chamber would be used primarily for deposition of metals, while the other would be designed for deposition of oxides and nitrides, including reactive processes involving the introduction of oxygen and/or nitrogen into the chamber.
Additional deposition chambers such as for pulsed laser deposition (PLD) and molecular beam epitaxy (MBE) are considered, as well. These are to be fully integrated into the vacuum transfer system above. As such, a suitable Nd:YAG laser is potentially required for PLD. Finally, in an attempt to improve the in-situ characterisation capabilities, a dedicated, wafer compatible X-ray photoelectron spectroscopy (XPS) analytics chamber is also considered.
Price is not the only award criterion and all criteria are stated only in the procurement documents
II.2.7)
Duration of the contract, framework agreement or dynamic purchasing system
Duration in months:
36
This contract is subject to renewal:
no
II.2.9)
Information about the limits on the number of candidates to be invited
Envisaged minimum number:
2
/
Maximum number:
5
Objective criteria for choosing the limited number of candidates:
Previous Experience
Profile of staff members along with CV’s
Quality Assurance
II.2.10)
Information about variants
Variants will be accepted:
no
II.2.11)
Information about options
Options:
no
II.2.13)
Information about European Union funds
The procurement is related to a project and/or programme financed by European Union funds:
yes
Identification of the project:
SFI-Funding Contribution
II.2.14)
Additional information
Sputter Disposition Tool for TCD required. See PQQ for details.