Date of dispatch of this notice: 15/10/2014
Expire date: 24/11/2014
External Reference: 2014-178359
TED Reference: 2014/S 201-354490
Date of dispatch of this notice: 15/10/2014
Expire date: 24/11/2014
External Reference: 2014-178359
TED Reference: 2014/S 201-354490
Chemical Vapour Deposition (CVD) System
republic of ireland
CVD tool should be able to synthesize carbon based, TMD and TMO thin films from gas/liquid/solid precursors. Two approaches must be possible– conversion of metal films and the CVD from metals organic precursors. This requires the possibility to deliver sold precursors and to operate the tool in an Atomic Layer Deposition (ALD) like mode.
CVD tool should be able to synthesize carbon based, TMD and TMO thin films from gas/liquid/solid precursors. Two approaches must be possible– conversion of metal films and the CVD from metals organic precursors. This requires the possibility to deliver sold precursors and to operate the tool in an Atomic Layer Deposition (ALD) like mode.
see RFT document on etenders.gov.ie
see RFT document on etenders.gov.ie
see RFT document on etenders.gov.ie
see RFT document on etenders.gov.ie
TCD-14-20