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Documents - Lot 171221:1 - UCC - RFT a Plasma Chemical Vapour Deposition System for Compound Semiconductors for the Tyndall National Institute
Document available to downloadSize (kB)
document  ESPD.docx47
document  LEE701C - CVD System Clarifications Document set 1.docx27
document  LEE701C - CVD System Clarifications Document.docx25
document  LEE701C - RFT - UCC.docx292
document  LEE701C - Technical Specification - CVD System for Compound Semiconductor.docx269
document  LEEE701C - Appendix 2 Pricing Schedule - CVD System.xlsx119
document  Updated sample requirements.docx15
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